cathode sputtering

基本解释

A new net-shape cathode sputtering target which has a simple structure and a high sputtering rate was put forward.
设计了一种网状阴极溅射靶，它是由多个空心阴极并列交叉组合而成。
It has the characteristic of working on higher pressure and lower voltage and having a high cathode sputtering rate.
它具有工作气压高，维持电压低，阴极溅射率高等特点。
The surface cleaning action, caused by the cathode sputtering phenomenon in ion bombardment brazing in glow discharge is investigated in this paper.
本文研究了辉光放电离子轰击钎焊时阴极溅射现象对工件表面的净化作用。