etch rate uniformity
常见例句
- It is proved that the uniformity of etch rate can be improved and the effect of micro load can be decreased by adjusting the value of chamber pressure, gas flow rate and RF power properly.
结果表明，通过对反应室压力、刻蚀气体流量和射频功率的调节，可以降低微负载效应的影响，得到良好的刻蚀均匀性。 返回 etch rate uniformity