sputtering target
基本解释
- 溅射靶
英汉例句
- Uses: sputtering target, physical vapor deposition, high temperature alloys.
溅射靶材、物理气相沉积、高温合金。 - Uses: sputtering target, physical vapor deposition, high temperature alloy for high-voltage vacuum switch contacts and precision alloy additives.
用途：溅射靶材、物理气相沉积、高温合金、用于高压真空开关触头及精密合金添加剂。 - The traditional upper limit of magnetic induction density B parallel to target surface in rectangular planar magnetron sputtering target has been increased by analyzing, designing and experimenting.
通过理论分析、实际设计和实验，对矩形平面磁控溅射靶表面水平磁感应强度B的传统取值上限进行了拓展。
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双语例句
词组短语
- CIGS sputtering targets 铜铟镓硒溅射靶材
- alloy sputtering targets 合金溅射靶
- Molybdenum alloy sputtering targets 钼合金溅射靶材
- Omat Sputtering Targets 欧莱溅射靶材
- High purity molybdenum sputtering targets 高纯钼溅射靶材
短语
专业释义
- 溅射靶